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乙二胺–硅烷偶联剂KH792汽液相平衡研究

A Study of Vapor–Liquid Equilibrium of EDA–Silane Coupling Agent KH792

  • 摘要: 为给精馏工艺分离乙二胺(EDA)−硅烷偶联剂N−β−(氨乙基)−γ−氨丙基三甲氧基硅烷(KH792)体系提供基础数据,采用Rose汽液平衡釜测定3~12 kPa范围内硅烷偶联剂KH792的饱和蒸气压和8 kPa下EDA−KH792的汽液平衡数据,采用Herington面积积分法检验所测数据的可靠性,在此基础上采用NRTL和Wilson活度系数模型对实验数据进行关联模拟。结果表明:NRTL和Wilson模型关联EDA−KH792体系的气相组成平均偏差分别为0.005 5,0.007 9,平衡温度平均偏差分别为0.897 1 ,1.163 1 K,两模型关联数据的偏差均较小,关联精确均较高,均可用于该体系的汽液平衡计算;但NRTL模型关联数据的偏差更小、精度更高,更适合该体系的汽液平衡计算。

     

    Abstract: In order to provide basic data for study of the separation of ethylenediamine (EDA)−silane coupling agent N−β− (Aminoethyl)−γ−aminopropyltrimethoxysilane (KH792) mixture by distillation process, the saturated vapor pressure of silane coupling agent KH792 at 3−12 kPa and the vapor−liquid equilibria (VLE) data of binary system of EDA−KH792 at 8 kPa were determined using Rose vapor–liquid equilibrium reactor, respectively. The reliability of the measured data was verified by Herington area integral method. On this basis, NRTL and Wilson activity coefficient models were used to correlate and simulate the experimental data. The results show that the average deviation of vapor phase composition in EDA−KH792 system associated with NRTL and Wilson models is 0.005 5 and 0.007 9, respectively. The average deviation of equilibrium temperature is 0.897 1 and 1.163 1 K, respectively. The deviation of the correlation data between the two models is small, and the accuracy of the correlation is high, which can be used for the calculation of vapor–liquid equilibrium in this system. However, NRTL model has a smaller deviation and higher accuracy in data association, making it more suitable for vapor–liquid equilibrium calculations in this system.

     

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